Nordson Electronics Solutions – Plasma Systems – Sphere Series

  • VIETNAM

    DKSH Technology Co.,Ltd
    Head office: 16th Floor, Peakview Tower Building, 36 Hoang Cau Street, O Cho Dua Ward, Dong Da District, Hanoi City.

    Ho Chi Minh Branch: 5th Floor, Viettel Complex Building, 285 Cach Mang Thang Tam, Ward 12, District 10, Ho Chi Minh City.

    Da Nang Branch: 14th Floor, VietinBank Building, 36 Tran Quoc Toan, Hai Chau District, Da Nang city.

    +84 28 3812 5806 Ext 89604

    Email

  • MesoSPHERE™ Plasma System brochure


  • StratoSPHERE™ Plasma System brochure


SPHERE series systems support automated handling and processing of round or square wafer/substrate sizes ranging from 75mm to 300mm. In addition, thin wafer processing with or without carriers is possible, depending upon wafer thickness.

The patented plasma chamber design provides exceptional etch uniformity and process repeatability. Primary plasma applications include a variety of etching, ashing, and descum steps. Other plasma processes include contamination removal, surface roughening, increasing wettability, and enhancing bonding and adhesion strength, photoresist/polymer stripping, dielectric etch, wafer bumping, organic contamination removal, and wafer destress.

  • Wafer Cleaning – The SPHERE series plasma systems remove contamination prior to wafer bumping, remove organic contamination, remove fluorine and other halogen contamination, and remove metal and metal oxides. Plasma also improves spun-on film adhesion and cleans metallic bond pads.
  • Wafer Etching – Plasma systems descum wafer of residual photoresist and BCB, pattern dielectric layers for redistribution, strip/etch photoresist, enhance adhesion of wafer applied materials, remove excess wafer applied mold /epoxy, enhance adhesion of gold solder bumps, destress wafer to reduce breakage, improve spun-on film adhesion, and clean aluminum bond pads.

Technical Specification

StratoSPHERE™MesoSPHERE™
W x D x H – Footprint1405W x 26150 x 1742H mm (55W x 103D x 69H in)Single Chamber werem: 1480W x 2700D x2180H mm (58W x 108D x 88H in)
Dual Chamber werem: 1480W x 2700D x2180H mm (58W x 106D x 88H in)
Quad Chamber w/ EFEM: 2695W x2700D x2190H mm (108W x106D x88H in)
Net Weight: Process Module
EFEM
480 kg (1058 Ibs)
640 kg (1411 Ibs)
725 kg (1600 Ibs)
880 kg (1800 Ibs)
Maximum Volume5.5 liters (338 in³)11.7 liters (715 in³)
Variable Electrode ConfigurationsPower-Ground, Ground-Power, Power-PowerPower-Ground, Ground-Power, Power-Power
Gas GeneratorsNitrogen, Hydrogen (Requires Additional Non-Optional Hardware)Nitrogen, Hydrogen (Requires Additional Non-Optional Hardware)
FacilitiesChiller, ScrubberChiller, Scrubber
For further details, please refer to enclosed brochure.

Key Industries

  • Semiconductor, Solar & Electronics

Brand

Nordson Electronics Solutions

Nordson Electronics Solutions is a leading provider of plasma processing technology to various industries such as semiconductor, PCB, microelectronics, solar, LED, and medical & life science device manufacturing. The company has global presence with offices and labs in several locations including California, Florida, Europe, Singapore, China, Japan, Korea, India and Taiwan. Nordson Electronics Solutions has been continuously innovating for more than two decades and offers a range of patented plasma processing systems that have won awards. The company also has a team of expert scientists and engineers to help develop plasma processes that enhance product reliability and production yields.

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